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Using Copolymer
Films as Scaffolds: A Novel Way to Self-Assemble
Organic-Inorganic Hybrid Structures
Self-assembly is emerging as elegant, “bottom-up”
method to fabricate nanostructured materials.
It becomes particularly powerful when the ease
and control offered by the self-assembly of
organic components is combined with the special
electronic, magnetic or photonic properties
of inorganic components. Here we demonstrate
a versatile hierarchical approach for the assembly
of organic-inorganic, copolymer-metal nanostructures
in which one level of self-assembly guides the
next. In a first step, ultrathin diblock copolymer
films form a regular scaffold of highly anisotropic,
stripe-like nanodomains. During a second assembly
step, differential wetting guides diffusing
metal atoms to selectively aggregate along the
scaffold, producing exquisitely organized metal
nanostructures. We find that metal on copolymer
scaffolds produces the most highly ordered configurations
far from equilibrium. We delineate two distinct
assembly modes of the metal component, “nanochains”
of separate nanoparticles, and continuous “nanowires”,
each characterized by different ordering kinetics
and strikingly different current-voltage characteristics.
These results provide new possibilities for
guided, large-scale assembly of laterally nanostructured
systems. Read more ...a nugget
on this work. Plus: an article in the UofC
Chronicle. Also: a colorized TEM image from
this work ended up as the promotional cover
of Nature Nanotechnology.
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Ward A.
Lopes and Heinrich M. Jaeger, “Hierarchical
Self-Assembly of Metal Nanostructures on Diblock
Copolymer Scaffolds”, Nature 414, 735
(2001)
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Ward A. Lopes,
“Non-Equilibrium self-assembly of metals
on diblock copolymer templates”, Phys.
Rev. E 65, 031606/1-14 (2002).
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Polymers Orient
in Electric Fields: First Demonstration of Lateral
Domain Alignment in Ultrathin Copolymer Films
Highly controlled alignment of diblock-copolymer
ultrathin films is demonstrated through the
use of external electric fields. Ultrathin films
of Polystyrene-Polymethylmethacrylate (PS-PMMA)
diblock-copolymers were spin-cast onto silicon
nitride membrane substrates with prefabricated
in-plane electrodes, forming cylindrical PMMA
domains. The films were annealed with an applied
electric field (E=3.7V/µm) at 250°C
for 24h under an argon atmosphere. Alignment
of copolymer cylindrical axes along the electric
field was observed directly by TEM. A quantitative
measure for the degree of alignment was obtained
by correlating the local field strength, E,
and direction with the observed cylinder orientation.
The alignment was found to saturate above E≈3V/µm,
and to decrease rapidly as E falls below this
value. Read more...a nugget
on this work with more explanations of copolymers.
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T. L. Morkved,
M. Lu, A. M. Urbas, E. E. Ehrichs, H. M. Jaeger,
P. Mansky, and T. P. Russell, "Local
Control of Micro-Domain Orientation in Diblock-Copolymer
Thin Films with Electric Fields", Science
273, 931 (1996).
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Discovery of a New Ultra-Thin Film Morphology
that Exhibits Lateral Domain Patterns Along
the Free Surface
We have investigated the morphology of lamellar
polystyrene-polymethylmetha- crylate diblock
copolymers in the ultrathin-film limit, spin-cast
and annealed on silicon nitride substrates.
Our experiments show evidence for a morphology
change from lamellar domains parallel to the
substrate to perpendicular domains that appears
to be unique to a thickness of one lamellar
repeat spacing and low annealing temperatures.
We find that in these ultrathin films phase
separation occurs well before thickness quantization,
suggesting effective confinement as a possible
mechanism. A model for the free energy of this
system is developed which takes into account
termination (“capping”) of the perpendicular
lamellae inside the film and at its top surface.
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T. L. Morkved
and H. M. Jaeger, "Thickness-Induced
Morphology Changes in Lamellar Diblock Copolymer
Ultrathin Films", Europhys. Lett. 40,
643 (1997).
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Forget
Transferring Polymer Films onto TEM Grids: Demonstration
of a New Method Using Silicon Wafers & First
Direct Imaging of Copolymer Defect Evolution by
both AFM and TEM
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T. L. Morkved, W. A. Lopes,
J. Hahm, S. J. Sibener, and H. M. Jaeger,
"Silicon Nitride Membrane Substrates
for the Investigation of Local Structure in
Polymer Thin Films", Polymer 39, 3871
(1998).
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First Direct Defect Tracking in Copolymer
Thin Films Using AFM
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J. Hahm, W.
A. Lopes, H. M. Jaeger and S. J. Sibener,
"Defect Evolution in Ultrathin Films
of PS-b-PMMA Diblock Copolymers Observed by
Atomic Force Microscopy", J. Phys. Chem.109,
10111 (1998).
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